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The precise control of crack propagation at bonded interfaces is crucial for smart adhesives with advanced performance. However, previous studies have primarily concentrated on either microscale or macroscale crack propagation. Here, we present a hybrid adhesive that integrates microarchitectures and macroscopic nonlinear cut architectures for unparalleled adhesion control. The integration of these architectural elements enables conformal attachment and simultaneous crack trapping across multiple scales for high capacity, enhancing adhesion by more than 70×, while facilitating crack propagation at the macroscale in specific directions for programmable release and reusability. As adhesion strength and directionality can be independently controlled at any location, skin adhesive patches are created that are breathable, nondamaging, and exceptionally strong and secure yet remove easily. These capabilities are demonstrated with a skin-mounted adhesive patch with integrated electronics that accurately detects human motion and wirelessly transmits signals, enabling real-time control of avatars in virtual reality applications. 

Switching of magnetization by spin–orbit torque in the (Ga,Mn)(As,P) film was studied with currents along ⟨100⟩ crystal directions and an in-plane magnetic field bias. This geometry allowed us to identify the presence of two independent spin–orbit-induced magnetic fields: the Rashba field and the Dresselhaus field. Specifically, we observe that when the in-plane bias field is along the current (I[Formula: see text]H bias ), switching is dominated by the Rashba field, while the Dresselhaus field dominates magnetization reversal when the bias field is perpendicular to the current (I ⊥ H bias ). In our experiments, the magnitudes of the Rashba and Dresselhaus fields were determined to be 2.0 and 7.5 Oe, respectively, at a current density of 8.0 × 10 5 A/cm 2 . 

Abstract Spin–orbit-induced (SOI) effective magnetic field in GaMnAs film with in-plane magnetic anisotropy has been investigated by planar Hall effect measurements. The presence of SOI field was identified by a shift between planar Hall resistance (PHR) hystereses observed with positive and negative currents. The difference of switching fields occurring between the two current polarities, which is determined by the strength of the SOI field, is shown to depend on the external field direction. In this paper we have developed a method for obtaining the magnitude of the SOI fields based on magnetic free energy that includes the effects of magnetic anisotropy and the SOI field. Using this approach, the SOI field for a given current density was accurately obtained by fitting to the observed dependence of the switching fields on the applied field directions. Values of the SOI field obtained with field scan PHR measurements give results that are consistent with those obtained by analyzing the angular dependence of PHR, indicating the reliability of the field scan PHR method for quantifying the SOI-field in GaMnAs films. The magnitude of the SOI field systematically increases with increasing current density, demonstrating the usefulness of SOI fields for manipulation of magnetization by current in GaMnAs films. 

We report the observation of current induced spin–orbit torque (SOT) switching of magnetization in a (Ga,Mn)(As,P) film using perpendicular magnetic anisotropy. Complete SOT switching of magnetization was achieved with current densities as low as 7.4 × 105 A/cm2, which is one to two orders of magnitude smaller than that normally used for SOT switching in ferromagnet/heavy metal bilayer systems. The observed magnetization switching chirality during current scans is consistent with SOT arising from spin polarization caused by the Dresselhaus-type spin–orbit-induced (SOI) fields. The magnitudes of effective SOI fields corresponding to the SOT were obtained from shifts of switching angles in angular dependent Hall measurements observed for opposite current polarities. By measuring effective SOI fields for the [11̄0] and the [110] current directions, we were then able to separate the values of the Dresselhaus-type (HeffD) and Rashba (HeffR) SOI fields. At a current density of 6.0 × 105 A/cm2, these values are HeffD=6.73Oe and HeffR=1.31Oe, respectively. The observed ratio of about 5:1 between Dresselhaus-type and Rashba SOI fields is similar to that observed in a GaMnAs film with an in-plane magnetic anisotropy.